Splitting of X-ray diffraction peak in (Ge:SiO2)/SiO2 multilayers

(Ge:SiO2)/SiO2 multilayers were fabricated for exploring the influence of the stress on the structure of Ge nanocrystals. When annealed at 800 °C, the multilayers show a clear splitting (fine structure) of the Ge (220) X-ray diffraction peak and have a preferred orientation. Similar effects cannot take place in the multilayers annealed at higher or lower temperature. Analyses of Raman scattering, X-ray diffraction spectroscopy, and transmission electron microscope observations suggest that the observed phenomena arise from compressive stress exerted on Ge nanocrystals, which is induced by the confinement of both the SiO2 matrix in the cosputtered layer and neighboring SiO2 layers. The stress may cause an orthorhombic distortion of the diamond structure of bulk Ge. This will lead to the disappearance of the (111) and (311) diffraction peaks and the splitting of the (220) peak. This kind of (Ge:SiO2)/SiO2 multilayers enables us to control the sizes of the Ge crystallites and enhance the stress, and is thus promising in forming new nanocrystal structures.