Structural and optical properties of pulsed laser deposited ZnO thin films

Nanocrystalline ZnO thin films were grown by means of pulsed laser deposition. The ablation process was carried out at relatively low background oxygen gas pressure (10 Pa) and by varying the substrate temperature up to 600 °C. Information on the structural and morphological properties of the deposited thin films have been obtained by means of X-ray photoelectron, Raman spectroscopies, X-ray diffraction (XRD) and atomic force microscopy (AFM). The results showed that all the deposited films are sub-stoichiometric in oxygen and with a hexagonal wurtzite crystalline structure, characterized by features of some tens of nanometers in size. An improvement of the filmsʹ crystalline quality was observed for the deposition temperature of 300 °C while the further increase of the deposition temperature up to 600 °C induces a worsening of the materialʹs structural properties with the development of a large amount of nanoparticleʹs clusters. The analysis of the XRD patterns shows a growth crystallographic preferential direction as a function of the deposition temperature, in agreement with the appearance of the only E2 optical phonon mode in the Raman spectra. Such findings are compatible with the changes observed in the photoluminescent (PL) optical response and was related to the modification of the ZnO thin film structural quality.