Title of article :
Photoluminescence of porous silicon coated by SILD method with LaF3 nanolayers
Author/Authors :
Milovanov، نويسنده , , Y.S. and Skryshevsky، نويسنده , , V.A. and Tolstoy، نويسنده , , V.P. and Gulina، نويسنده , , L.B. and Gavrilchenko، نويسنده , , I.V and Kuznetsov، نويسنده , , G.V.، نويسنده ,
Issue Information :
ماهنامه با شماره پیاپی سال 2013
Pages :
5
From page :
1625
To page :
1629
Abstract :
The method of lanthanum fluoride passivating layer synthesis in the matrix of porous silicon by successive ionic layer deposition was elaborated and optimized. Luminescence and FTIR of obtained structures demonstrate the crucial role of the chemical composition of silicon nanocrystallite surface in the formation of radiative recombination channels and in the stability of porous silicon photoluminescence. The combination of high optical transparency of LaF3 layers and low recombination losses in silicon covered with such layers allows to recommend the lanthanum fluoride film as an effective passivating coating for silicon optoelectronics devices.
Keywords :
Porous silicon , SILD , LaF3
Journal title :
Current Applied Physics
Serial Year :
2013
Journal title :
Current Applied Physics
Record number :
1791174
Link To Document :
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