Title of article :
Nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films
Author/Authors :
Ha، نويسنده , , Nguyen Duy and Kim، نويسنده , , Cheol Gi and Kim، نويسنده , , Chong Oh and Phan، نويسنده , , Manh-Huong Phan، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
4
From page :
502
To page :
505
Abstract :
This letter reports the novel nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films with varying thicknesses. Among the samples investigated, the film with a thickness of 432 nm exhibits the most excellent magnetic properties: high saturation magnetization, 4 π M s ∼ 19.86 kG , low coercivity, H c ∼ 1.5 Oe , and high hard-axis anisotropy field of H k ∼ 84 Oe . The magnetic permeability remains almost stable up to 3 GHz and reaches a maximum at the ferromagnetic resonant frequency of 4.024 GHz. The excellent magnetic characteristics of this film in addition to a very high electrical resistivity of 3569 μΩ cm make it ideal for uses in high-frequency applications of micromagnetic devices. It reveals that these superior properties are ascribed to the formed peculiar nanostructure. A magnetic phase separation appears to occur strongly as the film thickness increases over 437 nm, which, in turn, modifies the high-frequency behavior.
Keywords :
A. CoFeHfO thin films , D. Excellent electrical and magnetic properties , E. High-frequency applications
Journal title :
Solid State Communications
Serial Year :
2007
Journal title :
Solid State Communications
Record number :
1791360
Link To Document :
بازگشت