Author/Authors :
Shen، نويسنده , , Yanwei and Chen، نويسنده , , Xiang and Yan، نويسنده , , Xiaoqin and Yi، نويسنده , , Fang and Bai، نويسنده , , Zhiming and Zheng، نويسنده , , Xin and Lin، نويسنده , , Pei and Zhang، نويسنده , , Yue، نويسنده ,
Abstract :
High quality n-ZnO/p-GaN heterojunction was fabricated by growing highly crystalline ZnO epitaxial films on commercial p-type GaN substrates via radio frequency (RF) magnetron sputtering. Low-voltage blue light emitting diode with a turn-on voltage of ∼2.5 V from the n-ZnO/p-GaN heterojunction was demonstrated. The diode gives a bright blue light emission located at ∼460 nm and a low threshold voltage of 2.7 V for emission. Based on the results of the photoluminescence (PL) and electroluminescence (EL) spectra, the origins of the EL emissions were studied in the light of energy band diagrams of ZnO–GaN heterojunction, and may attribute to the radiative recombination of the holes in p-GaN and the electrons injected from n-ZnO, which almost happened on the side of p-GaN layer. These results may have important implications for developing short wavelength optoelectronic devices.
Keywords :
ZnO film , ZnO/GaN heterojunction , electroluminescence , RF magnetron sputtering