Title of article
The effect of carbon contamination and argon ion sputtering on the work function of chlorinated indium tin oxide
Author/Authors
Whitcher، نويسنده , , T.J. and Yeoh، نويسنده , , K.H. and Chua، نويسنده , , C.L. and Woon، نويسنده , , K.L. and Chanlek، نويسنده , , N. and Nakajima، نويسنده , , H. and Saisopa، نويسنده , , T. and Songsiriritthigul، نويسنده , , P.، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2014
Pages
4
From page
472
To page
475
Abstract
The work function of indium tin oxide (ITO) was increased by treating ITO with dichlorobenzene with UV light. Carbon contamination of the Cl-ITO was measured using X-ray Photoelectron Spectroscopy (XPS) and argon ion sputtering was used to remove the carbon from the surface. It was found that the carbon contamination from residual dichlorobenzene significantly lowered the work function of the ITO and after argon ion sputtering the work function increased to 5.8 eV. It was found that chlorination of ITO occurs after more than 6 min of UV exposure. Further sputtering of ITO resulted in the removal of the functionalized chlorine, the introduction of argon ion contaminants on the ITO decreases its work function.
Keywords
indium tin oxide , Carbon contamination , Work function
Journal title
Current Applied Physics
Serial Year
2014
Journal title
Current Applied Physics
Record number
1791899
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