Title of article :
Electrical characteristics of poly(methylsilsesquioxane) thin films for non-volatile memory
Author/Authors :
Ahmad، نويسنده , , Zubair and Ooi، نويسنده , , P.C. and Aw، نويسنده , , K.C. and Sayyad، نويسنده , , M.H.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Abstract :
In this communication the electrical characteristics of poly(methylsilsesquioxane) (PMSSQ) thin films and the possibility of charge storage in the Au nanoparticle embedded PMSSQ film base memory element have been studied. PMSSQ films were sandwiched between Al and Si electrodes to fabricate metal–polymer–semiconductor (MPS) structures. The conduction mechanism in PMSSQ films has been investigated. The charge transport mechanism appears to be space charge limited current (SCLC) at the higher-voltage region. Various electrical parameters such as reverse saturation current, barrier height, ideality factor, rectification ratio, shunt and series resistance and charge carrier mobility in PMSSQ have been determined. C – V analysis is performed to confirm the memory effect for Au nanoparticles embedded MPS structures. A definite clockwise hysteresis is observed which indicates the possibility of charge storage in the Au nanoparticles embedded PMSSQ film.
Keywords :
B. Spin casting , C. Metal–polymer–semiconductor (MPS) structure , D. Non-volatile memory , A. Polymethylsilsesquioxane
Journal title :
Solid State Communications
Journal title :
Solid State Communications