• Title of article

    Electrical characteristics of poly(methylsilsesquioxane) thin films for non-volatile memory

  • Author/Authors

    Ahmad، نويسنده , , Zubair and Ooi، نويسنده , , P.C. and Aw، نويسنده , , K.C. and Sayyad، نويسنده , , M.H.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2011
  • Pages
    4
  • From page
    297
  • To page
    300
  • Abstract
    In this communication the electrical characteristics of poly(methylsilsesquioxane) (PMSSQ) thin films and the possibility of charge storage in the Au nanoparticle embedded PMSSQ film base memory element have been studied. PMSSQ films were sandwiched between Al and Si electrodes to fabricate metal–polymer–semiconductor (MPS) structures. The conduction mechanism in PMSSQ films has been investigated. The charge transport mechanism appears to be space charge limited current (SCLC) at the higher-voltage region. Various electrical parameters such as reverse saturation current, barrier height, ideality factor, rectification ratio, shunt and series resistance and charge carrier mobility in PMSSQ have been determined. C – V analysis is performed to confirm the memory effect for Au nanoparticles embedded MPS structures. A definite clockwise hysteresis is observed which indicates the possibility of charge storage in the Au nanoparticles embedded PMSSQ film.
  • Keywords
    B. Spin casting , C. Metal–polymer–semiconductor (MPS) structure , D. Non-volatile memory , A. Polymethylsilsesquioxane
  • Journal title
    Solid State Communications
  • Serial Year
    2011
  • Journal title
    Solid State Communications
  • Record number

    1792017