Title of article
Negative differential capacitance in n-GaN/p-Si heterojunctions
Author/Authors
Kumar، نويسنده , , Mahesh and Bhat، نويسنده , , Thirumaleshwara N. and Rajpalke، نويسنده , , Mohana K. and Roul، نويسنده , , Basanta and Sinha، نويسنده , , Neeraj and Kalghatgi، نويسنده , , A.T. and Krupanidhi، نويسنده , , S.B.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
4
From page
356
To page
359
Abstract
Negative differential capacitance (NDC) has been observed in n-GaN/p-Si heterojunctions grown by plasma assisted molecular beam epitaxy (PAMBE). The NDC is observed at low frequencies 1 and 10 kilohertz (kHz) and disappeared at a higher testing frequency of 100 kHz. The NDC is also studied with temperature and found that it has disappeared above 323 ∘C. Current–Voltage ( I – V ) characteristics of n-GaN /p-Si heterojunction were measured at different temperatures and are attributed to the space-charge-limited current (SCLC). A simple model involving two quantum states is proposed to explain the observed NDC behavior.
Keywords
D. Heterojunctions , A. GaN , B. MBE , C. Negative differential capacitance
Journal title
Solid State Communications
Serial Year
2011
Journal title
Solid State Communications
Record number
1792042
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