Title of article
The stability of the fractional quantum Hall effect in topological insulators
Author/Authors
DaSilva، نويسنده , , Ashley M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
3
From page
1444
To page
1446
Abstract
With the recent observation of graphene-like Landau levels at the surface of topological insulators, the possibility of fractional quantum Hall effect, which is a fundamental signature of strong correlations, has become of interest. Some experiments have reported intra-Landau level structure that is suggestive of fractional quantum Hall effect. This paper discusses the feasibility of fractional quantum Hall effect from a theoretical perspective, and argues that while this effect should occur, ideally, in the n = 0 and | n | = 1 Landau levels, it is ruled out in higher | n | Landau levels. Unlike graphene, the fractional quantum Hall effect in topological insulators is predicted to show an interesting asymmetry between n = 1 and n = − 1 Landau levels due to spin–orbit coupling.
Keywords
A. Surfaces and interfaces , D. Fractional quantum Hall effect
Journal title
Solid State Communications
Serial Year
2011
Journal title
Solid State Communications
Record number
1792670
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