• Title of article

    The stability of the fractional quantum Hall effect in topological insulators

  • Author/Authors

    DaSilva، نويسنده , , Ashley M.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2011
  • Pages
    3
  • From page
    1444
  • To page
    1446
  • Abstract
    With the recent observation of graphene-like Landau levels at the surface of topological insulators, the possibility of fractional quantum Hall effect, which is a fundamental signature of strong correlations, has become of interest. Some experiments have reported intra-Landau level structure that is suggestive of fractional quantum Hall effect. This paper discusses the feasibility of fractional quantum Hall effect from a theoretical perspective, and argues that while this effect should occur, ideally, in the n = 0 and | n | = 1 Landau levels, it is ruled out in higher | n | Landau levels. Unlike graphene, the fractional quantum Hall effect in topological insulators is predicted to show an interesting asymmetry between n = 1 and n = − 1 Landau levels due to spin–orbit coupling.
  • Keywords
    A. Surfaces and interfaces , D. Fractional quantum Hall effect
  • Journal title
    Solid State Communications
  • Serial Year
    2011
  • Journal title
    Solid State Communications
  • Record number

    1792670