Title of article :
Optical characterization of band gap graded ZnMgO films
Author/Authors :
Choi، نويسنده , , Woo Seok and Yoon، نويسنده , , Jong-Gul، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
4
From page :
345
To page :
348
Abstract :
We investigated the optical properties of compositionally graded Zn1−xMgxO (g-ZnMgO) films using spectroscopic ellipsometry. The g-ZnMgO and ZnO films were grown on Pt/Ti/SiO2/Si substrates by ultrasonic spray pyrolysis. We simulated a uniformly graded optical band gap layer on the Pt substrate to reproduce the experimental result. The band gap of the bottommost layer of the g-ZnMgO film was estimated to be ∼3.22 eV, the same as the undoped ZnO film. Then we considered a linearly increasing band gap with the film composition, and obtained a band gap of ∼3.56 eV for the topmost layer of the film. In addition, the exciton peak showed a strong increase for the topmost layer of the film suggesting an important role of doping.
Keywords :
C. Optical dielectric constant and band gap characterization , A. Band gap graded ZnMgO , D. Graded band gap , E. Ellipsometry and simulation
Journal title :
Solid State Communications
Serial Year :
2012
Journal title :
Solid State Communications
Record number :
1793012
Link To Document :
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