TiNx layer as an antireflection and antistatic coating for display

In this study TiNx films were fabricated by a r.f. magnetron sputtering apparatus and the optical, electrical and structural properties were investigated. X-Ray photoelectron spectroscopy (XPS) measurements showed a Ti 2p3/2 peak at 456 eV after etching the oxidized film surface so that the formation of TiN bonding was confirmed. As the nitrogen gas flow rate increased, the XRD analysis showed that the TiN films were polycrystalline and the ratio of (200) to (111) intensity peak increased. The sheet resistivity of the films varied with the N2 flow rate and was influenced by the film thickness. Optical constants of TiNx films were measured by the spectroscopic ellipsometer and also calculated by fitting the measured reflectance to the Forouhi–Bloomer dispersion relation. From the measured optical constants the thickness of SiO2 layer was calculated for broadband AR coating in the visible region. Reflectance of a two-layer coating, TiNx and SiO2, on glass substrate was below 0.5% in the visible wavelength and the maximum transmittance was approximately 62% at 520 nm.