• Title of article

    Refractive index profiles in LiNbO3 waveguide formed by 3.2 MeV He ions

  • Author/Authors

    Wang، نويسنده , , Ke-Ming and Lu، نويسنده , , Fei and Hu، نويسنده , , Hui and Shi، نويسنده , , Bo-Rong and Wang، نويسنده , , Fengxiang and Xie، نويسنده , , Zhaoxia and Chen، نويسنده , , Feng and Wang، نويسنده , , Wei، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    5
  • From page
    465
  • To page
    469
  • Abstract
    Optically polished y-cut LiNbO3 was implanted at 3×1016 ions/cm2 at room temperature. In order to minimize any channeling effects, the sample was implanted at 7° off the major symmetry axis. The He beam current was approximately 700 nA and the scanning area was 0.8 cm2. The prism coupling method was carried out to measure the dark modes in the LiNbO3 waveguide. In the present work, an isosceles prism (rutile) was used. The dark modes were measured at 632.8 nm (He–Ne). Fifteen TM modes and 13 TE modes in the LiNbO3 waveguide were observed. We have used the reflectivity calculation method (RCM) developed by Chandler and Lama to fit the refractive index profile. This method has been used for ion-implanted waveguides based on dark mode lines by the prism coupling method. Also we have used the TRIM (transport of ions in matter) code to simulate the damage profile in LiNbO3 by 3.2 MeV He ions which is helpful for choosing the analytic function in RCM calculations.
  • Keywords
    Ion implantation , Rutherford backscattering spectroscopy , Defects , niobium oxide
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2000
  • Journal title
    Surface and Coatings Technology
  • Record number

    1799659