Title of article
Electromagnetic wave propagation in an ECR plasma
Author/Authors
Kawai، نويسنده , , Yoshinobu and Ueda، نويسنده , , Yoko، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
8
From page
12
To page
19
Abstract
Experiments on the production of a large diameter ECR plasma with microwaves of 2.45 GHz frequency are reviewed. It is pointed out that the electromagnetic waves play an important role in the uniformity as well as the production of an ECR plasma. Furthermore, it is found that the X wave contributes to plasma uniformity for an electron density of (1–2)×1017 m−3 at approximately the L cutoff. Mode conversion is also observed near the chamber, which is compared with a simulation.
Keywords
X wave , R wave , L wave , ECR plasma , Plasma uniformity
Journal title
Surface and Coatings Technology
Serial Year
2000
Journal title
Surface and Coatings Technology
Record number
1799775
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