• Title of article

    Electromagnetic wave propagation in an ECR plasma

  • Author/Authors

    Kawai، نويسنده , , Yoshinobu and Ueda، نويسنده , , Yoko، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    8
  • From page
    12
  • To page
    19
  • Abstract
    Experiments on the production of a large diameter ECR plasma with microwaves of 2.45 GHz frequency are reviewed. It is pointed out that the electromagnetic waves play an important role in the uniformity as well as the production of an ECR plasma. Furthermore, it is found that the X wave contributes to plasma uniformity for an electron density of (1–2)×1017 m−3 at approximately the L cutoff. Mode conversion is also observed near the chamber, which is compared with a simulation.
  • Keywords
    X wave , R wave , L wave , ECR plasma , Plasma uniformity
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2000
  • Journal title
    Surface and Coatings Technology
  • Record number

    1799775