Title of article
Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition
Author/Authors
Liu، نويسنده , , Minghai and Hu، نويسنده , , Xiwei and Wu، نويسنده , , Hanming and Wu، نويسنده , , Qinchong and Yu، نويسنده , , Guoyang and Pan، نويسنده , , Yuan، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
29
To page
33
Abstract
Using a refined two-dimensional hybrid-model with self-consistent microwave absorption, we have investigated the change of plasma parameters such as plasma density and ionization rate with the operating conditions. The dependence of the ion current density and ion energy and angle distribution function at the substrate surface vs. the radial position, pressure and microwave power were discussed. Results of our simulation can be compared qualitatively with many experimental measurements.
Keywords
Electron cyclotron resonance , PLASMA , Ionization , microwave , Density
Journal title
Surface and Coatings Technology
Serial Year
2000
Journal title
Surface and Coatings Technology
Record number
1799785
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