• Title of article

    Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition

  • Author/Authors

    Liu، نويسنده , , Minghai and Hu، نويسنده , , Xiwei and Wu، نويسنده , , Hanming and Wu، نويسنده , , Qinchong and Yu، نويسنده , , Guoyang and Pan، نويسنده , , Yuan، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    5
  • From page
    29
  • To page
    33
  • Abstract
    Using a refined two-dimensional hybrid-model with self-consistent microwave absorption, we have investigated the change of plasma parameters such as plasma density and ionization rate with the operating conditions. The dependence of the ion current density and ion energy and angle distribution function at the substrate surface vs. the radial position, pressure and microwave power were discussed. Results of our simulation can be compared qualitatively with many experimental measurements.
  • Keywords
    Electron cyclotron resonance , PLASMA , Ionization , microwave , Density
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2000
  • Journal title
    Surface and Coatings Technology
  • Record number

    1799785