Study of the surface-modified Teflon/ceramics complex material treated by microwave plasma with XPS analysis

A large volume microwave plasma source has been developed in our laboratory. The plasma is generated in a Pyrex glass cylinder with an inner diameter of 30 cm and a height of 50 cm, and the microwave power is coupled into the cylinder by eight equally spaced slot antennae on the inside wall of annular waveguide. The apparatus has been applied to surface modification of the material of PTFE/ceramic complex dielectrics (PTFEC). The chemical composition of the modified PTFEC was investigated by X-ray photoelectron spectroscopy (XPS). Under plasma treatment, the oxygen content of the surface is found to increase and fluorine content to decrease. XPS analysis proved that interaction between different plasma and PTFEC surface layer exists in etching, cross-linking, oxidizing simultaneously, and especially oxygen plasma etching.