Title of article :
Heat transfer simulation of HFCVD and fundamentals of diamond vapor growth reactor designing
Author/Authors :
Song، نويسنده , , G.H. and Sun، نويسنده , , C and Huang، نويسنده , , R.F and Wen، نويسنده , , L.S and Shi، نويسنده , , C.X، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Abstract :
Thermal blockage, thermal round flow and unevenness of state parameter fields have been revealed through simulation of heat transfer in hot filament chemical vapor growth and experimental study of the process. The phenomena lead to deviation from rational process conditions resulting in low growth rate, high production cost and instability of product quality. It has been shown that the state parameter field can be controlled and large area, high speed, high quality diamond growth can be realized by using a tubular reactor with a homogeneous distribution of hot filaments in the cross-section of the reactor and adiabatic boundary conditions.
Keywords :
Chemical vapor growth , SIMULATION , diamond
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology