• Title of article

    Heat transfer simulation of HFCVD and fundamentals of diamond vapor growth reactor designing

  • Author/Authors

    Song، نويسنده , , G.H. and Sun، نويسنده , , C and Huang، نويسنده , , R.F and Wen، نويسنده , , L.S and Shi، نويسنده , , C.X، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    6
  • From page
    500
  • To page
    505
  • Abstract
    Thermal blockage, thermal round flow and unevenness of state parameter fields have been revealed through simulation of heat transfer in hot filament chemical vapor growth and experimental study of the process. The phenomena lead to deviation from rational process conditions resulting in low growth rate, high production cost and instability of product quality. It has been shown that the state parameter field can be controlled and large area, high speed, high quality diamond growth can be realized by using a tubular reactor with a homogeneous distribution of hot filaments in the cross-section of the reactor and adiabatic boundary conditions.
  • Keywords
    Chemical vapor growth , SIMULATION , diamond
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2000
  • Journal title
    Surface and Coatings Technology
  • Record number

    1800053