Title of article :
Shunting arc as a pulsed ion source for solid-state materials for plasma-based ion implantation
Author/Authors :
Yukimura، نويسنده , , K and Yoshioka، نويسنده , , K and Tani، نويسنده , , Y and Masamune، نويسنده , , S، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
5
From page :
55
To page :
59
Abstract :
Shunting arc is an alternating capacitor discharge along a rod of solid-state materials. Optimization of the discharge condition has realized self-ignition of the arc discharge with low input power to the rod, leading to a much longer rod lifetime than in conventional shunting arcs or peripheral arcs. The shunting-arc-produced plasma contains mainly the ions of the solid-state material. Ion extraction from the plasma is demonstrated. Thus, the shunting arc works as a pulsed ion source for solid-state materials for plasma-based ion implantation (PBII) and ion processing.
Keywords :
Ion implantation , PLASMA , Shunting arc
Journal title :
Surface and Coatings Technology
Serial Year :
2001
Journal title :
Surface and Coatings Technology
Record number :
1800606
Link To Document :
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