Title of article :
Measurement of sheath expansion in plasma source ion implantation
Author/Authors :
Kim، نويسنده , , Young Woo and Kim، نويسنده , , Gon-Ho and Han، نويسنده , , Seunghee and Lee، نويسنده , , Yeonhee and Cho، نويسنده , , Jeonghee and Rhee، نويسنده , , Soo-Yong، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
5
From page :
97
To page :
101
Abstract :
In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a planar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse. (i) An ion-matrix sheath expansion scaled with the square root of pulse rise rate and the supersonic velocity during the pulse rise-time. (ii) A sheath expanding with the order of the ion sound speed in the flat-top phase of the pulse. And finally, (iii) sheath shrinking in the fall-time of the pulse. It was also observed that the ion wave was propagated into the plasma after the flat-top phase of the pulse.
Keywords :
Time-dependent sheath , Plasma source ion implantation , Langmuir Probe , Ion wave
Journal title :
Surface and Coatings Technology
Serial Year :
2001
Journal title :
Surface and Coatings Technology
Record number :
1800623
Link To Document :
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