Characterization of large area filtered arc deposition technology: part I — plasma processing parameters

The transmission of metal–gas plasma flow generated by large area, rectangular dual-filtered-arc source is investigated. The characteristic parameters of plasma flow such as ion current yield and inter-electrode voltage drop vs. gas pressure, are established for the deposition of TiN coatings. The uniformity and productivity of coating deposition on complex parts in a 3D operational volume is determined. It is found that ion current yield increases from 6 to 10 A with increasing argon pressure in the range of 2–7×10−2 Pa. It results in a deposition rate on the order 1–2 μm/h in a double rotation mode. It is shown that a thickness uniformity of ±10% or better can be achieved in a programmable, vertical scanning mode.