Formation of Al3Hf by Hf ion implantation into aluminum using a metal vapor vacuum arc ion source

The high aluminum content intermetallic compounds DO23–Al3Hf and L12–Al3Hf were directly formed by Hf ion implantation into Al matrix with an average current density of 64 μA/cm2 using a metal vapor vacuum arc (MEVVA) ion source at a dose from 3×1017 to 7×1017 ions/cm2. With increasing ion dose, the content of the DO23–Al3Hf and L12–Al3Hf phases increased. At a dose of 7×1017 ions/cm2, the Hf-aluminides layer was approximately 500 nm thick. The surface layer hardness of the sample implanted by Hf ions at a dose of 7×1017 ions/cm2 was approximately three times larger than that of the aluminum without any Hf ion implantation.