Magnetron sputtered CrNiN and TiMoN films: comparison of mechanical properties

This article reports on structure and mechanical properties of CrNiN and TiMoN films with a low (<10 at.%) content of Ni or Mo, respectively. The films were deposited by reactive sputtering using d.c. unbalanced magnetron equipped with a round planar Cr target fixed to the magnetron cathode with a Ni ring or alloyed TiMo (90:10 at.%) target. The investigation of sputtered films showed that: (i) both CrNiN and TiMoN films can form a superhard material with a maximum microhardness Hmax of approximately 45 GPa; (ii) the films with Hmax exhibit a single-oriented structure and; (iii) the CrNiN films exhibit a higher resistance to plastic deformation compared to the TiMoN films. The relationships between microhardness, H, reduced Youngʹs modulus, E*=E/(1−ν2), and elastic recovery, We, evaluated from loading/unloading curves measured using a computer-controlled microhardness tester Fisherscope H 100, are given; here E and ν are the Youngʹs modulus and Poisson ratio, respectively. The production of a high-temperature (β-Ti,Mo)(110) phase in pure TiMo alloy film sputtered on unheated steel substrate is also reported.