Fluid dynamic modelling and experimental diagnostics of an inductive high density plasma source (ICP)

A planar inductively coupled plasma source (ICP) used for diamond deposition experiments was characterised theoretically as well as experimentally. In the typical process window (gas pressure 400 Pa) the discharge shows strong local variations of temperature and electron density. Especially, the homogeneity of the plasma in dependence of the process pressure and coil configurations was investigated. Langmuir probe measurements for noble gas discharges in a wide pressure range were compared with theoretical data from a reactor model. A 2D-fluid plasma model, coupled self-consistently with an electrodynamic model, was used to calculate the theoretical results. Experiment and simulation show very good agreement with a wide range of parameters.