Title of article :
In situ film diagnostics during plasma polymerisation using waveguide mode spectroscopy
Author/Authors :
Jacobsen، نويسنده , , V. and Menges، نويسنده , , B. and Scheller، نويسنده , , A. and Fِrch، نويسنده , , R. and Mittler، نويسنده , , Mلrio S. and Knoll، نويسنده , , W.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
4
From page :
1105
To page :
1108
Abstract :
An in situ determination of the optical properties of films deposited during plasma polymerisation processes with nanometer accuracy has been realised using waveguide mode spectroscopy. The detection method relies on a bi-diffractive grating coupler with two grating constants and allows the background free detection of the propagation constants in a reflected mode geometry. It enables separate determination of the refractive index (n) and the thickness (d) as the plasma polymer film grows. The method has been applied in a preliminary study of the plasma assisted deposition mechanism of allylamine and maleic anhydride.
Keywords :
plasma polymerization , Waveguide mode spectroscopy , Refractive index , In situ characterization , Thin films
Journal title :
Surface and Coatings Technology
Serial Year :
2001
Journal title :
Surface and Coatings Technology
Record number :
1802474
Link To Document :
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