Title of article :
A comparative study on the crystallization behavior of electroless NiP and NiCuP deposits
Author/Authors :
Yu، نويسنده , , Hui-Sheng and Luo، نويسنده , , Shoufu and Wang، نويسنده , , Yong-Rui، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Abstract :
The crystallization behavior of electroless NiP and NiCuP was studied comparatively by using differential scanning calorimetry and X-ray diffractometry. It is apparent that low-P NiP deposits transform to the stable phase Ni3P directly, but low-P (high-Cu) NiCuP deposits transform to the metastable phase Ni5P2 first, and then to the stable Ni3P. Both the hypereutectic amorphous NiP deposits and amorphous NiCuP deposits with high phosphorus content transform to the metastable phases Ni5P2 and Ni12P5 first, then to the stable phase Ni3P. For the amorphous NiP and NiCuP deposits with P content of approximately 10 wt.%, the crystallization temperature of the latter is markedly higher than that of the former. In addition, the crystallization temperature of the hypereutectic NiP deposit is nearly the same as that of the amorphous NiCuP deposit with a similar P content. For the crystalline NiP and NiCuP deposits with low P content, the temperature at which the stable Ni3P forms in the latter is obviously higher than that of the former.
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology