Title of article :
Two-dimensional modeling and optimization of a neutral loop discharge etcher in an argon plasma
Author/Authors :
Okraku-Yirenkyi، نويسنده , , Yaw and Sung، نويسنده , , Youl-Moon and Otsubo، نويسنده , , Masahisa and Honda، نويسنده , , Chikahisa and Sakoda، نويسنده , , Tatsuya، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Abstract :
In order to ascertain the optimal conditions for plasma generation in a magnetic neutral loop discharge (NLD), experiments were conducted to determine the electron temperature, Te and electron density, ne distributions around the NL. For the plasma production efficiency, the ion flux density measurements were done. The experimental results were examined by using a model that included effects of a three-dimensional electromagnetic field with spatial decay of the RF electric field, and the limitation of the spatial extent of the electron motion and collision effect. From the experiments and modeling of the electron behavior, it was found that NLD plasma possesses the electron temperature Te and density ne peaks around the NL and there existed an optimum value of the magnetic field gradient for efficient plasma production.
Keywords :
Electron Temperature , electron density , Plasma processing , Neutral loop discharge , Electron meandering motion
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology