Title of article
Formation and characterization of BN films with Ti added
Author/Authors
Kurooka، نويسنده , , S. and Ikeda، نويسنده , , T. and Kohama، نويسنده , , K. and Tanaka، نويسنده , , T. and Tanaka، نويسنده , , A.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
6
From page
111
To page
116
Abstract
Boron nitride films with Ti added (BN:Ti) were prepared by a dual-ion beam sputtering method. The properties of the films were investigated by Fourier transform infrared spectrophotometer (FT-IR), electron spectroscopy for chemical analysis, X-ray diffractometer and the nano-indentation method. The structure of the BN:Ti films changed from the cubic phase to the hexagonal phase at more than 14.8 at.% added Ti. The internal stress and hardness decreased with an increase in the Ti content. With the reduction of the internal stress, the FT-IR absorption bands near 1100 cm−1 related to the cubic boron nitride phase changed to lower wavenumber. Added Ti atoms formed TiB2 and TiN in the films with a small amount of Ti content, but with increasing Ti content, mainly TiN was formed.
Keywords
Titanium , boron nitride , Nano-indentation , Fourier transform infrared spectroscopy , Ion beam deposition
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1805226
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