Effects of nitrogen partial pressure and pulse bias voltage on (Ti,Al)N coatings by arc ion plating

By virtue of the characteristics of arc ion plating (AIP) technique, the structure and composition of (Ti,Al)N coatings can be tailored by controlling N2 partial pressure and substrate bias. In this study, (Ti,Al)N coatings were deposited on 1Cr11Ni2W2MoV stainless steel by AIP. The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, elemental composition and phase structure of the coatings were investigated.