Title of article :
Characterization of pulse plated Cu2O thin films
Author/Authors :
Mahalingam، نويسنده , , T. and Chitra، نويسنده , , J.S.P. and Ravi، نويسنده , , G. and Chu، نويسنده , , J.P. and Sebastian، نويسنده , , P.J.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
4
From page :
111
To page :
114
Abstract :
Cuprous oxide (Cu2O) thin films are synthesised on Cu and tin oxide coated substrates by electrochemical pulse plating technique. The effect of current density and duty cycle on the growth of Cu2O films is studied. Structural studies reveal an optimum duty cycle of 33% to deposit well-crystallized Cu2O film. The effect of deposition parameters on the structural and optical properties are carried out. It is observed that annealing below 350 °C improved the crystallinity and grain size of Cu2O films whereas annealing above 450 °C exhibited the conversion of Cu2O into CuO. Photoelectrochemical solar cell studies showed improved performance for Cu2O electrodes and the results are discussed.
Keywords :
Photoelectrochemical solar cells , Etching studies , Annealing studies , Pulse plating technique , Cuprous oxide film
Journal title :
Surface and Coatings Technology
Serial Year :
2003
Journal title :
Surface and Coatings Technology
Record number :
1805431
Link To Document :
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