Enhancement of shielded cathodic arc deposition

A shielded-cathodic-arc-deposition (SCAD) technique was modified and enhanced to improve the deposition rate of droplet-free thin solid film. The technique was based on plasma transportation using the external magnetic field of a permanent magnet or electromagnetic coil. The deposition rate distribution of the titanium nitride (TiN) film was measured. A higher deposition rate at the substrate center was obtained by using a focusing magnet behind the substrate (enhanced shielded-cathodic arc deposition: E-SCAD). A higher and wider deposition rate was realized by using a focusing electromagnetic coil (improved E-SCAD: IE-SCAD).