Title of article
Enhancement of shielded cathodic arc deposition
Author/Authors
Takikawa، نويسنده , , Hirofumi and Nagayama، نويسنده , , Makoto and Miyano، نويسنده , , Ryuichi and Sakakibara، نويسنده , , Tateki، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
49
To page
52
Abstract
A shielded-cathodic-arc-deposition (SCAD) technique was modified and enhanced to improve the deposition rate of droplet-free thin solid film. The technique was based on plasma transportation using the external magnetic field of a permanent magnet or electromagnetic coil. The deposition rate distribution of the titanium nitride (TiN) film was measured. A higher deposition rate at the substrate center was obtained by using a focusing magnet behind the substrate (enhanced shielded-cathodic arc deposition: E-SCAD). A higher and wider deposition rate was realized by using a focusing electromagnetic coil (improved E-SCAD: IE-SCAD).
Keywords
Deposition Rate , Titanium nitride , Plasma transportation , Magnetic configuration , Shielded cathodic arc deposition
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1805516
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