Fabrication of nickel micro-pattern on insulating board by anodizing/laser irradiation/electrodeposition

Nickel micro-pattern was fabricated on an insulating board via anodizing aluminum, laser irradiation, nickel electroplating, insulating board attachment and aluminum substrate dissolution. Aluminum specimens covered with porous type oxide films were irradiated with a pulsed Nd–yttrium aluminum garnet laser through a convex lens with 10 mm focal length in a nickel electroplating solution to remove the anodic oxide film. The oxide film was destructed with minimum 6 μm width at the focal position. After laser irradiation, a nickel metal layer was electrodeposited at only the laser irradiated area. The specimen was attached on an epoxy resin before dissolving aluminum substrate. A nickel micro-pattern with a 9 μm line width and 12 μm intervals was obtained on the insulating board.