BCN coatings at low temperature using PACVD: capacitive vs. inductive plasma coupling

In this contribution, BCN coatings were deposited on polycarbonate by means of a capacitively or inductively coupled r.f.-PACVD (capacitive coupled plasma (CCP) vs. inductively coupled plasma (ICP)) using the metal-organic compound trimethylborazine as precursor with the B:C:N ratio of 1:1:1. The influence of the plasma parameters on the properties of films will be discussed. Compared to the CCP reactor, the ICP reactor design allows, through low energy and high density ion bombardment, the deposition of transparent and hard coatings on polymers.