Fabrication of nitrogen included carbon materials using microwave plasma CVD

Investigation was carried out on the fabrication of the nitrogen contained carbon from CH4–N2 reaction gas system using microwave plasma CVD. As a result of SEM observation, crystalline particles were observed at 1% CH4 concentration and the deposit changed to the film covered with whiskers at 10% CH4 concentration. From the AES estimation, nitrogen peak was observed from all samples and nitrogen inclusion was recognized.