Carbon films deposited with mass-selected carbon ion beams under substrate heating

Carbon films were prepared using mass-separated carbon ion beams at energy of 100 and 500 eV. The influence of substrate temperature during deposition on the structure and chemical bond of films was investigated. Chemical bonding in the films was examined using Auger electron spectroscopy and electron energy loss spectroscopy. The sp3 bond fraction of the films decreased with increasing substrate temperature. X-Ray diffraction measurements showed that the structure of films prepared at room temperature was amorphous and changed to graphite-like with increasing substrate temperature. The influence of substrate heating on the chemical bonding and the structure was similar for films prepared at energy of 100 and 500 eV. The surface morphology of the films prepared at 100 eV and room temperature had a smooth surface, and the graphite-like particles coalesced with substrate heating. The morphology of the films prepared at 500 eV was also smooth and particles were not observed. This was due to carbon ion bombardment of the film surface.