Title of article
Tribological characteristics of highly wear-durable ECR-sputtered silicon nitride films
Author/Authors
Tokai، نويسنده , , T. and Umemura، نويسنده , , S. and Hirono، نويسنده , , S. and Imoto، نويسنده , , A. and Kaneko، نويسنده , , R.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
3
From page
475
To page
477
Abstract
Silicon nitride films were deposited by ECR sputtering using a silicon target and a mixture of argon and nitrogen gases. The atomic composition, internal stress and wear durability of the deposited films were evaluated, the latter by an AFM nanowear test. We changed the deposition conditions and investigated the influence of the conditions on the internal stress and wear durability of the films deposited. Highly wear-durable silicon nitride film was deposited at a gas pressure of 0.14 Pa and nitrogen concentration of 16 vol.%.
Keywords
Atomic force microscopy (AFM) , Electron cyclotron resonance (ECR)Auger electron spectroscopy (AES) , Silicon nitride , Scratch test , Internal stress
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1805751
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