Title of article
Preparation of doped LaGaO3 films by pulsed laser deposition
Author/Authors
Kanazawa، نويسنده , , S. and Ito، نويسنده , , T. and Yamada، نويسنده , , K. and Ohkubo، نويسنده , , T. and Nomoto، نويسنده , , Y. and Ishihara، نويسنده , , T. and Takita، نويسنده , , Y.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
508
To page
511
Abstract
Doped LaGaO3 oxide is considered to be a promising candidate for an electrolyte in intermediate temperature operating solid oxide fuel cell. Doped LaGaO3 films, with the composition La1−xSrxGa1−yMgyO3−(x+y)/2 was prepared by the pulsed laser deposition technique. The dynamics of the plasma plume during the film deposition was investigated. The estimated velocity of the plume head was in the range of (0.5–1.5)×104 m/s depending on ambient pressures. The films deposited on the NiO substrate consisted of many particles and crystalline structure of LaGaO3 was obtained for post annealed films at 1000 °C for 6 h. A slight difference in stoichiometry between the target and the film was found by secondary ion mass spectroscopy.
Keywords
solid oxide fuel cells , Plasma plume , pulsed laser deposition , LSGM films
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1805774
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