Title of article :
Early stage of tin oxide film growth in chemical vapor deposition
Author/Authors :
Matsui، نويسنده , , Yuji and Mitsuhashi، نويسنده , , Michio and Goto، نويسنده , , Yoshio، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Abstract :
Early stage of film growth was studied for chemical vapor deposition tin oxide films. Nucleation of films was observed by using an atomic force microscope. It was found nucleation structure of the crystallites changed from isolated island-like to tightly interconnected as methanol concentration into source gases increased.
Keywords :
Nucleation , atomic force microscopy , Tin oxide , Atmospheric pressure chemical vapor deposition
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology
