MgO thin films for plasma display panel formed by plasma process

A RF ion plating method has been developed to make high quality magnesium oxide (MgO) films with high crystallinity and a preferred [1 1 1] orientation. These properties were comparable to those produced by vacuum evaporation with a high voltage electron beam gun, which is currently the predominant deposition method for MgO coating. MgO films deposited by these methods were studied as a function of various process parameters such as the deposition rate and substrate temperature. Crystal structures were investigated by X-ray diffraction and transmission electron microscopy.