Giant magnetostrictive thin film formation by plasma process

In this study, the effects of geometrical arrangement of substrate on the magnetostriction of the giant magnetostrictive materials film using an ion plating process were discussed. With increasing substrate angle, coercive force remained almost constant value and the in-plane magnetization at 15 kOe was strongly increased. This indicates that the easy direction of magnetization was changed from perpendicular to in-plane by obliquely deposition. The magnetic and magnetostrictive characteristics of the obliquely deposited films were affected by an oblique anisotropy. The oblique anisotropy may be induced by the shape anisotropy connected with columnar grain morphology.