Recent development in a TEM specimen preparation technique using FIB for semiconductor devices

A brief overview of the transmission electron microscope (TEM) operation in the semiconductor industry is given. A recent emergence of a focused ion-beam (FIB) machine as a dedicated TEM specimen preparation tool has changed the role of TEM in the semiconductor industry dramatically. Advantages and disadvantages of TEM specimens prepared by a FIB machine are discussed together with damage produced by high-energy ion beams.