Title of article :
Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma
Author/Authors :
You، نويسنده , , S.J. and Bai، نويسنده , , K.H. and In، نويسنده , , J.H. and Chang، نويسنده , , H.Y. and Choi، نويسنده , , C.K.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
5
From page :
226
To page :
230
Abstract :
We investigated r.f. sheath width variation in transversely magnetized capacitive coupled plasma. While increasing the magnetic field, a paradoxical sheath width variation was observed. Although the electron density decreases with increasing magnetic field, the r.f. sheath width (S0∝1/√ne) decreases with increasing magnetic field. This paradoxical result originates from the overlooking of the axial electron density profile variation by the magnetic field.
Keywords :
Capacitive coupled plasma , Magnetic field , R.f. sheath
Journal title :
Surface and Coatings Technology
Serial Year :
2003
Journal title :
Surface and Coatings Technology
Record number :
1806013
Link To Document :
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