Title of article
Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma
Author/Authors
You، نويسنده , , S.J. and Bai، نويسنده , , K.H. and In، نويسنده , , J.H. and Chang، نويسنده , , H.Y. and Choi، نويسنده , , C.K.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
5
From page
226
To page
230
Abstract
We investigated r.f. sheath width variation in transversely magnetized capacitive coupled plasma. While increasing the magnetic field, a paradoxical sheath width variation was observed. Although the electron density decreases with increasing magnetic field, the r.f. sheath width (S0∝1/√ne) decreases with increasing magnetic field. This paradoxical result originates from the overlooking of the axial electron density profile variation by the magnetic field.
Keywords
Capacitive coupled plasma , Magnetic field , R.f. sheath
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1806013
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