• Title of article

    Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma

  • Author/Authors

    You، نويسنده , , S.J. and Bai، نويسنده , , K.H. and In، نويسنده , , J.H. and Chang، نويسنده , , H.Y. and Choi، نويسنده , , C.K.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    5
  • From page
    226
  • To page
    230
  • Abstract
    We investigated r.f. sheath width variation in transversely magnetized capacitive coupled plasma. While increasing the magnetic field, a paradoxical sheath width variation was observed. Although the electron density decreases with increasing magnetic field, the r.f. sheath width (S0∝1/√ne) decreases with increasing magnetic field. This paradoxical result originates from the overlooking of the axial electron density profile variation by the magnetic field.
  • Keywords
    Capacitive coupled plasma , Magnetic field , R.f. sheath
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2003
  • Journal title
    Surface and Coatings Technology
  • Record number

    1806013