Application of multi-ion beam enhanced deposition

The equipment for the multi-ion beam enhanced deposition (MIBED) is composed of metal ion implantor, gas ion implantor and low energy Ar ion sputtering system, and the applications of (TiMo)N, new scheme of metallization for diamond film and some functional materials films prepared by MIBED technique were studied, the analyses results show that the adhesion of the films to substrates is higher because of a mixed interface formed and good behaviors of the films prepared at low temperature were obtained. A Monte-Carlo model of MIBED was presented to simulate the deposition procedure, the relationship between the calculated composition of the film and the atomic arrival ratio has been established, the simulated composition profile of film is in good agreement with the experimental results.