Preparation of magnetron sputtered TiNxOy thin films

Within the frame of this work, r.f. reactive magnetron sputtered TiNxOy films were deposited on steel, silicon and glass substrates at a constant temperature of 300 °C. The depositions were carried out from a pure Ti target, under the variation of process parameters such as the substrate bias voltage and flow rate of reactive gases (a mixture of N2/O2). Film colours varied from the glossy golden type for low oxygen content (characteristic of TiN films) to dark blue for higher oxygen contents. X-ray diffraction (XRD) results revealed the development of a face-centred cubic phase with 〈111〉 orientation (TiN type; lattice parameter of approx. 0.429 nm), and traces of some oxide phases. Scanning electron microscopy (SEM) revealed a mixture of very dense and columnar type structures. All these results have been analysed, and are presented as a function of both the deposition parameters and the particular composition, and crystalline phases present in the films.