Synthesis and properties of high density MgO films deposited by magnetron sputtering with ion extraction system

New magnetron sputtering system, which included simply designed ion extraction grids, was developed in our laboratory in order to synthesize high density MgO films. For the investigation of the effect on grids assisted magnetron, MgO films were synthesized by three types of magnetron: (i) conventional magnetron; (ii) one grid assisted magnetron; and (iii) two grids assisted magnetron. The saturated substrate ion current density and Mg ion fraction in MgO discharges generated by grids assisted magnetron were increased in comparison with those obtained in conventional magnetron, which means that the grids assisted magnetron led to the enhancement of plasma density. An employment of ion extraction grids in magnetron sputtering induced the increase of film density as well as transmittance and the decrease of Rms roughness.