Title of article :
Characterisations of atmospheric pressure ejected plasma sources
Author/Authors :
Kim، نويسنده , , Yong-Hwan and Choi، نويسنده , , Yoon Ho and Kim، نويسنده , , Ji-Hun and Park، نويسنده , , Jongkyu and Ju، نويسنده , , Won-Tae and Paek، نويسنده , , Kwang-Hyun and Hwang، نويسنده , , Yong-Seok، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
6
From page :
535
To page :
540
Abstract :
Atmospheric pressure ejected plasma sources have been developed for processing arbitrary shaped objects. Plasma sources with two coaxial electrodes are characterised experimentally by varying source design parameters such as discharge volume and discharge gap distance under various operating conditions such as RF power, gas flow rate, and gas compositions. Using optical emission spectroscopy (OES), gas temperatures and radical densities are qualitatively evaluated for flexible applications of the source. Discharge characteristics as glow has been confirmed with voltage and current (V–I) probes. Based on these source characteristics, specific design rules are presented for various applications such as polymer surface modification and metal surface decontamination.
Keywords :
Radical density , Atmospheric pressure ejected plasma , Gas temperature , OES
Journal title :
Surface and Coatings Technology
Serial Year :
2003
Journal title :
Surface and Coatings Technology
Record number :
1806540
Link To Document :
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