Title of article :
Plasma diagnostics in a double inductively coupled source (DICP) for plasma sterilisation
Author/Authors :
A. Messerer، نويسنده , , P. and Boenigk، نويسنده , , B. and Keil، نويسنده , , G. and Scheubert، نويسنده , , P. and Awakowicz، نويسنده , , P.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
4
From page :
570
To page :
573
Abstract :
As a response to the need for sterilising thermolabile implant materials like polylactide or ultra-high-molecular-weight-polyethylene (UHMWPE) without toxic or water containing liquids or gases, a new kind of plasma reactor was developed. In order to achieve homogenous sterilisation efficiency, this reactor is equipped with two flat rf coils, one on top and one on bottom. Based on harmless and well-known gases like argon, hydrogen and nitrogen, good sterilisation results with Bacilus subtilis test spores have been obtained. To investigate the different plasma mechanisms necessary for the reduction of germs and spores, the plasma was analyzed by Langmuir probe (APS3) measurement, mass spectrometry and simulation. The design of the electro-polished stainless-steel chamber and the coil configuration was also based on simulation. The in-house plasma model consists on a hydrodynamic code for transport behavior and an electrodynamic part for rf coupling [Scheubert et al. J. Appl. Phys. 90(2) (2001) 587–598].
Keywords :
DICP , model , Sterilisation
Journal title :
Surface and Coatings Technology
Serial Year :
2003
Journal title :
Surface and Coatings Technology
Record number :
1806554
Link To Document :
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