Synthesis of TiO2 films by ICP-assisted DC magnetron sputtering

TiO2 films were deposited by inductively coupled plasma (ICP)-assisted DC magnetron sputtering, and the structure and properties of these films were investigated. By applying ICP to conventional DC magnetron sputtering, crystalline TiO2 films with the anatase structure could be obtained, even without additional substrate heating, while only amorphous TiO2 films were obtained at 160 °C without ICP. It is suggested that the high ion density in ICP and the plasma heating effect could promote crystalline TiO2 film formation. The average transmittance of the films was approximately 80% in the range of visible light, and no oxygen deficiencies could be found in the films, despite the fact that the deposition was carried out at a low oxygen partial pressure. The surface morphology and transmittance of the films did not show any great changes at different ICP power.