Laser-enhanced selective TiO2 deposition on Si

A novel additive deposition method for the fabrication of TiO2 micro-patterns is demonstrated in this paper. Thin (<1 μm) and narrow (∼3 μm) titanium oxide/hydroxide and TiO2 deposits on Si wafers were realized using laser direct writing in gel films and solutions, respectively. By post-annealing the laser-written patterns (derived from gel) in a furnace, the deposits turned into stochiometric TiO2. The obtained micro-structures were characterized by using SEM/EDX and AFM.