High temperature nitrogen plasma immersion ion implantation into molybdenum

High dose, high temperature nitrogen implantation into molybdenum was realised in a plasma immersion ion implantation system with additional heating in the temperature range between 500 and 750 °C. X-ray diffraction spectra show the transformation of c-Mo2N into t-Mo2N near 580 °C. At the same temperature, the thermally activated growth of the layer thickness by diffusion from the surface became noticeable. A variation of the pulse voltage between 5 and 30 kV did not change the nitrogen surface concentration in sputter saturation.