Corrosion behavior of TiN films prepared by vacuum arc deposition and nitrogen ion beam dynamic mixing implantation

TiN films have been prepared by vacuum arc deposition and nitrogen ion beam dynamic mixing implantation. The effects of nitrogen ion incident angle to the substrate on the corrosion resistance of the TiN films in 0.5 M H2SO4 solution and in 0.5 M NaCl solution have studied. The results indicate that the increase of nitrogen ion incident angle to substrate significantly improves the corrosion resistance of the TiN films in 0.5 M H2SO4 solution and in 0.5 M NaCl solution. Scanning electron microscopy and X-ray diffraction used to investigate the surface morphologies and structure of the TiN films. The results show that, with the increase of nitrogen ion incident angle, the surface morphologies of the TiN films change from slightly rough to quite smooth and the number of the pores on the surface of the TiN films descends. However, the structure of the TiN films has less dependence on the ion beam incident angle.