Metal plasma source for PBII using arc-like discharge with hot cathode

A plasma source using arc-like discharge for plasma-based ion implantation (PBII) has been developed. Molten metals such as titanium are used as cathode in this plasma source. The utilization of the arc-like discharge in PBII systems is reported for the first time. The plasma source with the arc-like discharge provides a new promising method to enable macroparticle-free process without magnetic filter. The characteristics of the arc-like discharge using the hot cathode and application for a plasma source of PBII process are reported. The implanted dose distribution on a substrate with spherical shape is measured using Rutherford back scattering (RBS).